What are the performance advantages and application scenarios of white synthetic fiber polishing cloth (PSA)?- Trojan (Suzhou) material technology Co., Ltd.

What are the performance advantages and application scenarios of white synthetic fiber polishing cloth (PSA)?

15-05-2025

PSA polishing cloth uses synthetic fiber as the base material, and forms a dense fiber network through special spinning process and post-processing technology. Its core performance characteristics can be summarized into three points:

The molecular chain structure of synthetic fiber gives PSA polishing cloth high strength and high modulus characteristics, so that it maintains structural stability under high-speed friction conditions. The orientation and crystallinity of the fiber directly affect the polishing efficiency: high-oriented fiber can provide uniform cutting force, while high crystallinity enhances the wear resistance of the fiber.

The glass transition temperature (about 275℃) and softening temperature (367~370℃) of PSA polishing cloth are significantly higher than those of ordinary synthetic fibers, so that it can still maintain dimensional stability under high-temperature polishing conditions. This feature originates from the introduction of strong electron-withdrawing groups (such as sulfonyl groups) in its molecular chain, which effectively reduces the electron cloud density of amide nitrogen atoms, thereby improving thermal stability.

Except for polar organic solvents (such as DMF, DMAC) and concentrated sulfuric acid, PSA polishing cloth shows good tolerance to chemicals such as acids, alkalis, and oxidants at room temperature. This feature enables it to maintain stable polishing performance in complex chemical environments, and is particularly suitable for fields with extremely high cleanliness requirements such as semiconductor manufacturing and precision optical processing.

Application scenarios of PSA polishing cloth in the industrial field
In ferrous metal polishing, PSA polishing cloth shows significant efficiency advantages. For example, with 6~15μm diamond polishing liquid, it can achieve rough polishing of ferrous metals; while with 0.3~3μm alumina polishing liquid, it is suitable for fine polishing and final polishing of most materials. This performance stems from the microstructure of its fiber surface: the diamond texture formed by longitudinal etching and the circular/elliptical cross-section work together to ensure the uniformity of cutting force distribution and avoid excessive damage to the material surface.

For difficult-to-process materials such as cemented carbide, PSA polishing cloth achieves a balance between cutting force and surface quality by optimizing fiber diameter and arrangement density. Experiments show that with the assistance of 0.5~6μm diamond polishing liquid, it can effectively control the heat accumulation during the polishing process and avoid thermal damage to the material surface. This feature makes it irreplaceable in the processing of precision parts in the fields of aerospace, medical equipment, etc.

In the polishing of semiconductor wafers, the chemical stability and thermal stability of PSA polishing cloth become key advantages. Its fiber surface can load a variety of nano-abrasives, and achieve sub-nanometer surface roughness by precisely controlling the polishing pressure and rotation speed. In addition, its dimensional stability ensures the repeatability of the polishing process and meets the stringent requirements of integrated circuit manufacturing for process consistency.

Technical Advantages Analysis of PSA Polishing Cloth
PSA polishing cloth has achieved a performance breakthrough through molecular chain design: the bonding structure of acylamino and sulfonyl groups gives it flame retardancy (limiting oxygen index 33%), while the double bond conjugated system of benzene ring significantly improves its resistance to thermal oxidation aging. This material innovation enables it to maintain stable polishing performance under extreme conditions such as high temperature and high humidity.

The spinning process and post-processing technology of PSA polishing cloth realize the precise regulation of fiber properties. For example, by adjusting the spinning solution concentration and stretching rate, the diameter and orientation of the fiber can be controlled; while the heat setting treatment further optimizes the crystallinity and surface roughness of the fiber. This process flexibility enables it to meet the customized needs of different processing scenarios.

Compared with traditional polishing media, PSA polishing cloth reduces the use of harmful solvents in the production process, and its waste can be harmlessly treated by incineration or chemical degradation. In addition, its wear resistance prolongs its service life and reduces the amount of industrial waste generated, which is in line with the development trend of green manufacturing.